['Air Programs']
['Greenhouse Gases']
12/27/2024
Copyright 2025 J. J. Keller & Associate, Inc. For re-use options please contact copyright@jjkeller.com or call 800-558-5011.
...
| Process type | In-situ thermal or in-situ plasma cleaning | Remote plasma cleaning | ||||||
|---|---|---|---|---|---|---|---|---|
| Gas | CF 4 | C 2 F 6 | c-C 4 F 8 | NF 3 | SF 6 | C 3 F 8 | CF 4 | NF 3 |
| * If you manufacture MEMS or PVs and use semiconductor tools and processes, you may use the corresponding in this table. For all other tools and processes, a default of 10 must be used. | ||||||||
| If manufacturing wafer sizes ≤200 mm AND manufacturing 300 mm (or greater) wafer sizes | ||||||||
| i | 13 | 9.3 | 4.7 | 14 | 11 | NA | NA | 5.7 |
| CF4,i | NA | 23 | 6.7 | 63 | 8.7 | NA | NA | 58 |
| C2F6,i | NA | NA | NA | NA | 3.4 | NA | NA | NA |
| CHF3,i | NA | NA | NA | NA | NA | NA | NA | 0.24 |
| CH2F2,i | NA | NA | NA | NA | NA | NA | NA | 111 |
| CH3F,i | NA | NA | NA | NA | NA | NA | NA | 33 |
| If manufacturing ≤200 mm OR manufacturing 300 mm (or greater) wafer sizes | ||||||||
| i (≤ 200 mm wafer size) | 13 | 9.3 | 4.7 | 2.9 | 11 | NA | NA | 1.4 |
| CF4,i (≤200 mm wafer size) | NA | 23 | 6.7 | 110 | 8.7 | NA | NA | 36 |
| C2F6,i (≤200 mm wafer size) | NA | NA | NA | NA | 3.4 | NA | NA | NA |
| i (300 mm wafer size) | NA | NA | NA | 26 | NA | NA | NA | 10 |
| CF4,i (300 mm wafer size) | NA | NA | NA | 17 | NA | NA | NA | 80 |
| C2F6,i (300 mm wafer size) | NA | NA | NA | NA | NA | NA | NA | NA |
| CHF3,i (300 mm wafer size) | NA | NA | NA | NA | NA | NA | NA | 0.24 |
| CH2F2,i (300 mm wafer size) | NA | NA | NA | NA | NA | NA | NA | 111 |
| CH3F,i (300 mm wafer size) | NA | NA | NA | NA | NA | NA | NA | 33 |
[89 FR 31922, Apr. 25, 2024]
['Air Programs']
['Greenhouse Gases']
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Copyright 2025 J. J. Keller & Associate, Inc. For re-use options please contact copyright@jjkeller.com or call 800-558-5011.