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['Air Programs']
['Greenhouse Gases']
12/27/2024
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Table I-3 to Subpart I of Part 98—Default Emission Factors (1-Uij) for Gas Utilization Rates (Uij) and By-Product Formation Rates (Bijk) for Semiconductor Manufacturing for 150mm and 200 mm Wafer Sizes
| Notes: NA = Not applicable; i.e., there are no applicable default emission factor measurements for this gas. This does not necessarily imply that a particular gas is not used in or emitted from a particular process sub-type or process type. | |||||||||||||
| Process type/sub-type | Process gas i | ||||||||||||
| CF 4 | C 2 F 6 | CHF 3 | CH 2 F 2 | C 2 HF 5 | CH 3 F | C 3 F 8 | C 4 F 8 | NF 3 | SF 6 | C 4 F 6 | C 5 F 8 | C 4 F 8 O | |
| Etching/Wafer Cleaning | |||||||||||||
| 1-U i | 0.73 | 0.72 | 0.51 | 0.13 | 0.064 | 0.70 | NA | 0.14 | 0.19 | 0.55 | 0.083 | 0.072 | NA |
| BCF 4 | NA | 0.10 | 0.085 | 0.079 | 0.077 | NA | NA | 0.11 | 0.0040 | 0.13 | 0.095 | NA | NA |
| BC 2 F 6 | 0.041 | NA | 0.035 | 0.025 | 0.024 | 0.0034 | NA | 0.037 | 0.025 | 0.11 | 0.073 | 0.014 | NA |
| BC 4 F 8 | NA | NA | NA | NA | NA | NA | NA | NA | NA | NA | NA | NA | NA |
| BC 3 F 8 | NA | NA | NA | NA | NA | NA | NA | NA | NA | NA | NA | NA | NA |
| BCHF 3 | 0.091 | 0.047 | NA | 0.049 | NA | NA | NA | 0.040 | NA | 0.0012 | 0.066 | 0.0039 | NA |
| Chamber Cleaning | |||||||||||||
| In situ plasma cleaning | |||||||||||||
| 1-U i | 0.92 | 0.55 | NA | NA | NA | NA | 0.40 | 0.10 | 0.18 | NA | NA | NA | 0.14 |
| BCF 4 | NA | 0.19 | NA | NA | NA | NA | 0.20 | 0.11 | 0.14 | NA | NA | NA | 0.13 |
| BC 2 F 6 | NA | NA | NA | NA | NA | NA | NA | NA | NA | NA | NA | NA | 0.045 |
| BC 3 F 8 | NA | NA | NA | NA | NA | NA | NA | NA | NA | NA | NA | NA | NA |
| Remote plasma cleaning | |||||||||||||
| 1-U i | NA | NA | NA | NA | NA | NA | NA | NA | 0.028 | NA | NA | NA | NA |
| BCF 4 | NA | NA | NA | NA | NA | NA | NA | NA | 0.015 | NA | NA | NA | NA |
| BC 2 F 6 | NA | NA | NA | NA | NA | NA | NA | NA | NA | NA | NA | NA | NA |
| BC 3 F 8 | NA | NA | NA | NA | NA | NA | NA | NA | NA | NA | NA | NA | NA |
| BF 2 | NA | NA | NA | NA | NA | NA | NA | NA | 0.5 | NA | NA | NA | NA |
| In situ thermal cleaning | |||||||||||||
| 1-U i | NA | NA | NA | NA | NA | NA | NA | NA | NA | NA | NA | NA | NA |
| BCF 4 | NA | NA | NA | NA | NA | NA | NA | NA | NA | NA | NA | NA | NA |
| BC 2 F 6 | NA | NA | NA | NA | NA | NA | NA | NA | NA | NA | NA | NA | NA |
| BC 3 F 8 | NA | NA | NA | NA | NA | NA | NA | NA | NA | NA | NA | NA | NA |
[75 FR 74829, Dec. 1, 2010; 78 FR 68222, Nov. 13, 2013; 81 FR 89255, Dec. 9, 2016; 89 FR 31920, Apr. 25, 2024]
['Air Programs']
['Greenhouse Gases']
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