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Notes: NA = Not applicable; i.e., there are no applicable default emission factor measurements for this gas. This does not necessarily imply that a particular gas is not used in or emitted from a particular process sub-type or process type. | |||||||||
Process type factors | Process gas i | ||||||||
CF4 | C2F6 | CHF3 | CH2F2 | C3F8 | c− C4F8 | NF3 Remote | NF3 | SF6 | |
Etch 1-Ui | 0.7 | 0.4 | 0.4 | NA | NA | 0.2 | NA | NA | 0.4 |
Etch BCF4 | NA | 0.2 | NA | NA | NA | 0.1 | NA | NA | NA |
Etch BC2F6 | NA | NA | NA | NA | NA | 0.1 | NA | NA | NA |
CVD Chamber Cleaning 1-Ui | NA | 0.6 | NA | NA | 0.1 | 0.1 | NA | 0.3 | 0.4 |
CVD Chamber Cleaning BCF4 | NA | 0.2 | NA | NA | 0.2 | 0.1 | NA | NA | NA |
[75 FR 74831, Dec. 1, 2010; 78 FR 68226, Nov. 13, 2013; 80 FR 12934, March 12, 2015]